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Common Platform for Intellectual Property Qualification (CPIPQ)

Project Title:
Common Platform for Intellectual Property Qualification (CPIPQ)
Project Reference:
ART/072CP
Project Type:
Project Period:
20090901 - 20101130
Funds Approved (HK$’000):
4219
Project Coordinator:
Mr Yiu-kei Li
Deputy Project Coordinator:
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Deliverable:
1. Enhancement on Soft IP Qualification based on the seed project recommendations 2. Development of a new Hard IP Qualification based on the seed project recommendations and industrial needs 3. Development of Trusted IP Partner Qualification 4. Development of User Kits
Research Group:
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Sponsor:
Mentor Graphics Corporation [Sponsor]
Description:
This project is the follow-on development of ASTRI’s IC Design IP Standardization Initiative, based on previous work on seed project Intellectual Property Quality Infrastructure – Quality Index (IPQI-QI). This will be an effort to drive the Common Platform for IP Qualification in IC industry. IPQI-QI seed project mainly focused on the quality of the IP but not a common standard among different industrial parties in IP qualification. Currently, there are requests from the IC Design Industry, e.g. SMIC, and China Standardization bodies, e.g. Shanghai Silicon Intellectual Property Exchange (SSIPEX), on the establishment of a Common Platform for IP Qualification. The Platform can benefit both IP vendor and customer which IP vendor can have develop a high quality IP based on industrial common standards, and, at the same time, IP customer can have open standards to evaluate and qualify the 3rd party IP to be purchased. The Platform will be possibly licensed to not only IP provider and IP integrator but also IP evaluator, which can be a neutral party to provide IP qualification service and IP trading. There are potential Joint effort between standard bodies from China, e.g. China IP Standards Working Group, and worldwide, e.g. IEEE Quality IP Study Group. By collaborating with the standard bodies, the level of recognition of the Common Platform could be greatly increased.
Co-Applicant:
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Keywords:
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